FIZIKA B 4 (1995) 1, 53-57

size 100 kBsize 210 kB

LETTER TO THE EDITOR

CR-39(DOP) AS A RELATIVISTIC  238U-ION DETECTOR

DEBA P. BHATTACHARYYA, RUMA RAKSHIT and PRATIBHA PAL
Department of Theoretical Physics,
Indian Association for the Cultivation of Science,
Jadavpur, Calcutta 700 032, India

Received 1 September 1994
Revised manuscript received 14 November 1994

CR-39(DOP) stack was exposed to 927 MeV/n  23892U beam from the Lawrence Berkeley Laboratory (LBL) accelerator BEVALAC at an angle of 30o to the detector surface. The chemically processed sheets were investigated using a Leitz Ortholux optical microscope. 644 etch pit cone lengths were measured and the track etch rate has been found to be (174 11) mm/h. The present result is in accord with the data of Heyna et al. The estimated charge sensitivity has been found to follow the extrapolated results of Salamon et al. The present survey on the etch rate ratio has been found to increase faster than exponentially with Z/b and follows the relation VT/VG=exp[A + B(Z/b-60) + C(Z/b-60)2] where A=1.6230.064, B=-0.04440.0015 and C=0.0005060.000064 for 27.6 Z/b 106.4.

UDC 539.17
PACS 25.75.+r
Copyright by The Croatian Physical Society
For problems or questions please contact fizika@fizika.hfd.hr