FIZIKA A 2 (1993) 2, 71-78

SOME MAGNETIC AND MAGNETORESISTIVE PROPERTIES OF RF-SPUTTERED THIN NiFe-Si FILMS

MARIA VATSKICHEVA, LYUDMIL VATSKICHEV, IVAN DIMITROV and BORISLAV KUNEV*
Faculty of Physics, Sofia University, 5 James Bourchier Blvd, Sofia 1126, Bulgaria
*Institute of Solid State Physics, 72 Tsarigradsko chaussť, Sofia 1784, Bulgaria

Received 2 January 1993
Revised manuscript received 4 May 1993

Original scientific paper

The galvanomagnetic properties and some structural peculiarities of rf-sputtered alloy films (NI80Fe20)100-xSix at 0<x<30 at. % were studied and compared with the corresponding properties of evaporated films of the same thickness and composition. The content of silicon increased with the increasing of the velocity of deposition and led to the amorphousation of the films. Coercivity decreased with the velocity of growth but it did not depend on the thickness and on the velocity of film deposition. The magnetoresistance ratio Dr/r of the sputtered films was about three times higher then that of the evaporated films.

UDC 538.955

 

 

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